Dr. George’s research interests are in the areas of surface chemistry, thin film growth and etching, and nanostructure engineering. He is currently directing a research effort focusing on atomic layer etching (ALE), atomic layer deposition (ALD) and molecular layer deposition (MLD). This research is examining new surface chemistry, measuring thin film growth rates, measuring thin film etching rates, characterizing the properties of films, and developing new reactors for ALE, ALD and MLD. Special areas of interest are determining new surface chemistries for thermal ALE, examining the enhancement of ALD and ALE using low energy electrons, and developing in situ methods for monitoring the growth & etching of thin films. There are many applications of ALE, ALD & MLD to modern technology. Application areas include: semiconductor processing, MEMS/NEMS, Li ion batteries, fuel cells, supercapacitors, gas sensors, nano-photovoltaic devices, gas diffusion barriers and flexible & protective coatings.
keywords
Surface Chemistry, Thin Film Growth & Etching, Nanostructure Engineering, Atomic Layer Deposition, Molecular Layer Deposition, Characterization and Properties of Thin Films, Materials Chemistry, Atomic Layer Etching
