Topics in surface chemistry and thin film growth with focus on atomic layer deposition (ALD) and molecular layer deposition (MLD). Properties of thin films grown using ALD and MLD. Applications of thin films in areas including flexible displays, energy storage and catalysis. May be repeated up to 6 total credit hours. Department consent required.
instructor(s)
George, Steven
Primary Instructor
- Spring 2023 / Fall 2023 / Spring 2024
