Thermal atomic layer etching of crystalline aluminum nitride using sequential, self-limiting hydrogen fluoride and Sn(acac)2 reactions and enhancement by H2 and Ar plasmas Journal Article uri icon

Overview

publication date

  • September 1, 2016

has restriction

  • hybrid

Date in CU Experts

  • October 20, 2016 10:08 AM

Full Author List

  • Johnson NR; Sun H; Sharma K; George SM

author count

  • 4

citation count

  • 63

Other Profiles

International Standard Serial Number (ISSN)

  • 0734-2101

Electronic International Standard Serial Number (EISSN)

  • 1520-8559

Additional Document Info

volume

  • 34

issue

  • 5

number

  • ARTN 050603