Journal of Vacuum Science and Technology Part A: International Journal Devoted to Vacuum, Surfaces, and Films
Overview
publication venue for
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Al2O3 atomic layer deposition on a porous matrix of carbon fibers (FiberForm) for oxidation resistance
2023
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Electron-enhanced atomic layer deposition of Ru thin films using Ru(DMBD)(CO)3 and effect of forming gas anneal
2023
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Electron-enhanced SiO2 atomic layer deposition at 35 degrees C using disilane and ozone or water as reactants
2023
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Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition
2023
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Thermal atomic layer etching of VO2 using sequential BCl3 and SF4 exposures: Observation of conversion, ligand-exchange, and oxidation state changes
2023
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Spontaneous etching of B2O3 by HF gas studied using infrared spectroscopy, mass spectrometry, and density functional theory
2022
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Deposit and etchback approach for ultrathin Al2O3 films with low pinhole density using atomic layer deposition and atomic layer etching
2021
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Molecular layer deposition of Nylon 2,6 polyamide polymer on flat and particle substrates in an isothermal enclosure containing a rotary reactor
2021
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Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition
2021
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Thermal atomic layer etching of amorphous and crystalline Al2O3 films
2021
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Thermal atomic layer etching: A review
2021
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Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica
2021
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Atomic layer deposition of hafnium and zirconium oxyfluoride thin films
2021
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Conversion reactions in atomic layer processing with emphasis on ZnO conversion to Al2O3 by trimethylaluminum
2021
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Thermal atomic layer etching of germanium-rich SiGe using an oxidation and "conversion-etch" mechanism
2021
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Thermal ranges and figures of merit for gold-containing precursors for atomic layer deposition
2021
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Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
2020
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History of atomic layer deposition and its relationship with the American Vacuum Society (vol 31, 050818, 2013)
2020
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Atomic layer deposition of aluminum oxyfluoride thin films with tunable stoichiometry
2020
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Effect of crystallinity on thermal atomic layer etching of hafnium oxide, zirconium oxide, and hafnium zirconium oxide
2020
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Thermal atomic layer etching of silicon nitride using an oxidation and "conversion etch" mechanism
2020
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Thermal etching of AlF3 and thermal atomic layer etching of Al2O3
2020
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Growth of cobalt films at room temperature using sequential exposures of cobalt tricarbonyl nitrosyl and low energy electrons
2019
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Rapid atomic layer etching of Al2O3 using sequential exposures of hydrogen fluoride and trimethylaluminum with no purging
2018
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Thermal atomic layer etching of HfO2 using HF for fluorination and TiCl4 for ligand-exchange
2018
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Electron-enhanced atomic layer deposition of silicon thin films at room temperature
2018
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Spatial atomic layer deposition for coating flexible porous Li-ion battery electrodes
2018
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Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor
2018
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Structural and compositional characterization of RF magnetron cosputtered lithium silicate films: From Li2Si2O5 to lithium-rich Li8SiO6
2017
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Thermal atomic layer etching of crystalline aluminum nitride using sequential, self-limiting hydrogen fluoride and Sn(acac)2 reactions and enhancement by H2 and Ar plasmas
2016
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Probabilistic distributions of pinhole defects in atomic layer deposited films on polymeric substrates
2016
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Spatial atomic layer deposition on flexible porous substrates: ZnO on anodic aluminum oxide films and Al2O3 on Li ion battery electrodes
2016
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Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
2015
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Spatial atomic layer deposition on flexible substrates using a modular rotating cylinder reactor
2015
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Atmospheric pressure spatial atomic layer deposition web coating with in situ monitoring of film thickness
2014
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Waterless TiO2 atomic layer deposition using titanium tetrachloride and titanium tetraisopropoxide
2014
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History of atomic layer deposition and its relationship with the American Vacuum Society
2013
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Evaluating Al2O3 gas diffusion barriers grown directly on Ca films using atomic layer deposition techniques
2013
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In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl)ruthenium] and molecular oxygen
2012
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Evaluating operating conditions for continuous atmospheric atomic layer deposition using a multiple slit gas source head
2012
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Nanocoating zinc alkoxide (zincone) hybrid polymer films on particles using a fluidized bed reactor
2012
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Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition
2012
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Phase, grain structure, stress, and resistivity of sputter-deposited tungsten films
2011
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Photovoltaic manufacturing: Present status, future prospects, and research needs
2011
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Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
2009
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Tungsten atomic layer deposition on cobalt nanoparticles
2008
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Optimized reactive ion etch process for high performance SiC bipolar junction transistors
2007
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Rotary reactor for atomic layer deposition on large quantities of nanoparticles
2007
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Wide-range vibratory vacuum gauge
2006
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Attenuation of hydrogen radicals traveling under flowing gas conditions through tubes of different materials
2006
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Free molecular background flow in a vacuum chamber equipped with two-sided pumps
2006
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In situ examination of tin oxide atomic layer deposition using quartz crystal microbalance and Fourier transform infrared techniques
2005
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Surface chemistry and infrared absorbance changes during ZnO atomic layer deposition on ZrO2 and BaTiO3 particles
2005
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Infrared spectroscopic study of atomic layer deposition mechanism for hafnium silicate thin films using HfCl2[N(SiMe3)2]2 and H2O
2004
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Microstructure and properties of ultrathin amorphous silicon nitride protective coating
2003
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Photoinduced anisotropy of second-harmonic generation from azobenzene-modified alkylsiloxane monolayers
2003
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Charging of dust particles on surfaces
2001
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Monte Carlo modeling of electron beam physical vapor deposition of yttrium
2000
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Monte Carlo simulation of vapor transport in physical vapor deposition of titanium
2000
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Modeling of silicon deposition process scale-up employing axisymmetric ring nozzle sources. I
1999
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Three dimensional modeling of silicon deposition process scale-up employing supersonic jets. II
1999
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Nonlinear modeling, identification, and feedback control design for the modern effusion cell
1998
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Effects of wall recombination on the etch rate and plasma composition of an etch reactor
1998
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Numerical simulation of the evolution of nanometer-scale surface topography generated by ion milling
1998
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Monte Carlo analysis of a hyperthermal silicon deposition process
1998
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Influence of cluster diffusion on the coarsening of Xe films on Pt(111)
1997
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Numerical study of the effects of reactor geometry on a chlorine plasma helicon etch reactor
1997
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Particle beam mass spectrometer measurements of particle formation during low pressure chemical vapor deposition of polysilicon and SiO2 films
1996
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H2O ADSORPTION-KINETICS ON SI(111)7X7 AND SI(111)7X7 MODIFIED BY LASER ANNEALING
1995
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HYPERTHERMAL NEUTRAL BEAM ETCHING
1995
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SAMPLE MANIPULATOR EMPLOYING A GAS-THERMAL SWITCH DESIGNED FOR HIGH-PRESSURE EXPERIMENTS IN AN ULTRAHIGH-VACUUM APPARATUS
1995
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ADSORPTION AND DECOMPOSITION OF DICHLOROSILANE ON POROUS SILICON SURFACES
1995
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ADSORPTION AND DECOMPOSITION OF TRICHLOROSILANE AND TRICHLOROGERMANE ON POROUS SILICON AND SI(100)2X1 SURFACES
1995
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DYNAMICS OF THE DESORPTION OF D(2) AND H-2 FROM CU(111)
1993
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DYNAMIC STUDIES OF THE INTERACTION OF D2 WITH A CU(111) SURFACE
1992
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ADSORPTION AND DESORPTION-KINETICS FOR SIH2CL2 ON SI(111)7X7
1992
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A REACTIVE COEVAPORATION SYSTEM FOR INSITU, EPITAXIAL YBA2CU3O7-X THIN-FILM DEPOSITION
1991
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AMMONIA DECOMPOSITION ON SILICON SURFACES STUDIED USING TRANSMISSION FOURIER-TRANSFORM INFRARED-SPECTROSCOPY
1991
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ROUGHNESS AND POROSITY CHARACTERIZATION OF CARBON AND MAGNETIC-FILMS THROUGH ADSORPTION-ISOTHERM MEASUREMENTS
1989
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ELECTRONIC-STRUCTURE AND STABILITY OF II-VI SEMICONDUCTORS AND THEIR ALLOYS - THE ROLE OF METAL D-BANDS
1988
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INTERACTIONS AND ELECTRONIC-ENERGY TRANSFER BETWEEN MOLECULES ON DIELECTRIC SURFACES - PHENANTHRENE ON AL2O3(1120)
1988
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SURFACE-DIFFUSION OF CO ON RU(001) STUDIED USING LASER-INDUCED THERMAL-DESORPTION
1988
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SURFACE-DIFFUSION OF CYCLOALKANES ON RU(001)
1988
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SURFACE-DIFFUSION OF HYDROGEN ON CARBON-COVERED AND SULFUR-COVERED RU(001) STUDIED USING LASER-INDUCED THERMAL-DESORPTION
1988
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THE COPPER SILICON INTERFACE - COMPOSITION AND INTERDIFFUSION
1988
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HIGH-SPEED SCANNING TUNNELING MICROSCOPES
1988
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THE DECOMPOSITION KINETICS OF METHANOL ON RU(001) STUDIED USING LASER-INDUCED THERMAL-DESORPTION
1987
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A SIMPLE AND VERSATILE LIQUID-NITROGEN COOLED CRYOSTAT ON A DIFFERENTIALLY PUMPED ROTARY FEEDTHROUGH
1986
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OXIDE FORMATION ON ALUMINUM IN THE PRESENCE OF KEV ELECTRONS AND CO2
1984
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ANALYSIS OF CO-DOPED IRON-OXIDE THIN-FILMS BY GRAZING-INCIDENCE X-RAY-DIFFRACTION
1988
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LOW-ENERGY ELECTRON-DIFFRACTION STUDY OF THE PHASES AND PHASE-TRANSITIONS OF OXYGEN PHYSISORBED ON GRAPHITE
1984
Research
keywords
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09 Engineering, 02 Physical Sciences