Rapid atomic layer etching of Al2O3 using sequential exposures of hydrogen fluoride and trimethylaluminum with no purging Journal Article uri icon

Overview

publication date

  • November 1, 2018

has restriction

  • closed

Date in CU Experts

  • December 6, 2018 12:18 PM

Full Author List

  • Zywotko DR; Faguet J; George SM

author count

  • 3

citation count

  • 25

Other Profiles

International Standard Serial Number (ISSN)

  • 0734-2101

Electronic International Standard Serial Number (EISSN)

  • 1520-8559

Additional Document Info

volume

  • 36

issue

  • 6

number

  • ARTN 061508