High-k Dielectrics Grown by Atomic Layer Deposition: Capacitor and Gate Applications Chapter uri icon



  • Manipulating the materials and their properties at atomic dimensions has become a must. This book presents the case of interlayer dielectrics materials whilst considering these challenges.

publication date

  • October 13, 2003

Date in CU Experts

  • February 3, 2014 1:47 AM

Full Author List


Full Editor List

  • Muraka SP

author count

  • 1

Other Profiles

International Standard Book Number (ISBN) 10

  • 0080521959

International Standard Book Number (ISBN) 13

  • 9780080521954