Film and surface stress during Al2O3 and AlF3 atomic layer deposition using in situ wafer curvature measurements
Journal Article
Overview
publication date
- April 1, 2026
Date in CU Experts
- December 24, 2025 10:30 AM
Full Author List
- Vanfleet RB; Sortino E; Cavanagh AS; Bright VM; George SM
author count
- 5
citation count
- 1
published in
- Applied Surface Science Journal
Other Profiles
International Standard Serial Number (ISSN)
- 0169-4332
Electronic International Standard Serial Number (EISSN)
- 1873-5584
Digital Object Identifier (DOI)
Additional Document Info
volume
- 724
number
- ARTN 165642