Film and surface stress during Al2O3 and AlF3 atomic layer deposition using in situ wafer curvature measurements Journal Article uri icon

Overview

publication date

  • April 1, 2026

Date in CU Experts

  • December 24, 2025 10:30 AM

Full Author List

  • Vanfleet RB; Sortino E; Cavanagh AS; Bright VM; George SM

author count

  • 5

citation count

  • 1

Other Profiles

International Standard Serial Number (ISSN)

  • 0169-4332

Electronic International Standard Serial Number (EISSN)

  • 1873-5584

Additional Document Info

volume

  • 724

number

  • ARTN 165642