Influence of Substrate Temperature and Plasma Power Density on the Properties of Plasma-Assisted Chemical Vapor Deposited Titanium Nitride Journal Article uri icon

Overview

publication date

  • November 1, 1995

Date in CU Experts

  • May 6, 2026 4:02 AM

Full Author List

  • Crummenauer J; Stock H-R; Mayr P

author count

  • 3

Other Profiles

International Standard Serial Number (ISSN)

  • 1042-6914

Electronic International Standard Serial Number (EISSN)

  • 1532-2475

Additional Document Info

start page

  • 1267

end page

  • 1276

volume

  • 10

issue

  • 6