The role of stress in nanoimprint lithography Conference Proceeding

Overview

CU Boulder Authors

• Ding, Yifu

publication date

• February 21, 2006

has restriction

• closed

Date in CU Experts

• November 5, 2021 11:40 AM

Full Author List

• Ro HW; Ding Y; Lee H-J; Hines DR; Jones RL; Lin EK; Karim A; Wu W-L; Soles CL

Full Editor List

• Lercel MJ

author count

• 9

published in

• Proceedings of SPIE  Journal

presented at event

• Conference on Emerging Lithographic Technologies X  Conference

Other Profiles

International Standard Serial Number (ISSN)

• 0277-786X

Digital Object Identifier (DOI)

• https://doi.org/10.1117/12.656742

International Standard Book Number (ISBN) 10

• 0-8194-6194-6

Additional Document Info

start page

• U448

end page

• U454

volume

• 6151