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Porosity in plasma enhanced chemical vapor deposited SiCOH dielectrics: A comparative study
Journal Article
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Additional Document Info
Overview
publication date
September 1, 2003
has restriction
closed
Date in CU Experts
November 5, 2020 2:39 AM
Full Author List
Grill A; Patel V; Rodbell KP; Huang E; Baklanov MR; Mogilnikov KP; Toney M; Kim HC
author count
8
citation count
99
published in
Journal of Applied Physics
Journal
Other Profiles
International Standard Serial Number (ISSN)
0021-8979
Digital Object Identifier (DOI)
https://doi.org/10.1063/1.1599957
Additional Document Info
start page
3427
end page
3435
volume
94
issue
5